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dc.contributor.authorSzili, Endre
dc.contributor.authorKumar, Sunil
dc.contributor.authorSmart, Roger
dc.contributor.authorVoelcker, Nicolas Hans
dc.date.accessioned2014-09-30T06:07:57Z
dc.date.available2014-09-30T06:07:57Z
dc.date.issued2009en_US
dc.identifier.citationSzili, E., Kumar, S., Smart, R. and Voelcker, N.H. (2009). Generation of a stable surface concentration of amino groups on silica coated onto titanium substrates by the plasma enhanced chemical vapour deposition method. Applied Surface Science, 255(15) pp. 6846-6850.en
dc.identifier.issn0169-4332en_US
dc.identifier.urihttp://hdl.handle.net/2328/32218
dc.titleGeneration of a stable surface concentration of amino groups on silica coated onto titanium substrates by the plasma enhanced chemical vapour deposition methoden_US
dc.typeArticleen_US
dc.identifier.rmid2006013252en_US
dc.identifier.doihttps://doi.org/10.1016/j.apsusc.2009.02.092en
dc.subject.forgroup0912 Materials Engineeringen_US


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